dc.contributor.author | Zhou, Xiaorun | |
dc.contributor.author | Lu, Taiping | |
dc.contributor.author | Zhu, Yadan | |
dc.contributor.author | Zhao, Guangzhou | |
dc.contributor.author | Dong, Hailiang | |
dc.contributor.author | Jia, Zhigang | |
dc.contributor.author | Yang, Yongzhen | |
dc.contributor.author | Chen, Yong | |
dc.contributor.author | Xu, Bingshe | |
dc.date.accessioned | 2017-08-30T16:31:46Z | |
dc.date.available | 2017-08-30T16:31:46Z | |
dc.date.issued | 2017-05-16 | |
dc.identifier.citation | Zhou , X , Lu , T , Zhu , Y , Zhao , G , Dong , H , Jia , Z , Yang , Y , Chen , Y & Xu , B 2017 , ' Surface Morphology Evolution Mechanisms of InGaN/GaN Multiple Quantum Wells with Mixture N 2 /H 2 -Grown GaN Barrier ' , Nanoscale Research Letters , vol. 12 , 354 . https://doi.org/10.1186/s11671-017-2115-8 | |
dc.identifier.issn | 1931-7573 | |
dc.identifier.uri | http://hdl.handle.net/2299/19259 | |
dc.description | This is an Open Access article distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. | |
dc.description.abstract | Surface morphology evolution mechanisms of InGaN/GaN multiple quantum wells (MQWs) during GaN barrier growth with different hydrogen (H2) percentages have been systematically studied. Ga surface-diffusion rate, stress relaxation, and H2 etching effect are found to be the main affecting factors of the surface evolution. As the percentage of H2 increases from 0 to 6.25%, Ga surface-diffusion rate and the etch effect are gradually enhanced, which is beneficial to obtaining a smooth surface with low pits density. As the H2 proportion further increases, stress relaxation and H2 over- etching effect begin to be the dominant factors, which degrade surface quality. Furthermore, the effects of surface evolution on the interface and optical properties of InGaN/GaN MQWs are also profoundly discussed. The comprehensive study on the surface evolution mechanisms herein provides both technical and theoretical support for the fabrication of high-quality InGaN/GaN heterostructures. | en |
dc.format.extent | 1788455 | |
dc.language.iso | eng | |
dc.relation.ispartof | Nanoscale Research Letters | |
dc.subject | GaN barrier | |
dc.subject | Hydrogen | |
dc.subject | Interface | |
dc.subject | Surface | |
dc.subject | Materials Science(all) | |
dc.subject | Condensed Matter Physics | |
dc.title | Surface Morphology Evolution Mechanisms of InGaN/GaN Multiple Quantum Wells with Mixture N2/H2-Grown GaN Barrier | en |
dc.contributor.institution | School of Engineering and Technology | |
dc.contributor.institution | Centre for Engineering Research | |
dc.contributor.institution | Sustainable Energy Technologies | |
dc.description.status | Peer reviewed | |
dc.identifier.url | http://www.scopus.com/inward/record.url?scp=85019226176&partnerID=8YFLogxK | |
rioxxterms.versionofrecord | 10.1186/s11671-017-2115-8 | |
rioxxterms.type | Journal Article/Review | |
herts.preservation.rarelyaccessed | true | |